| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus and a method of exposing a wafer periphery which suppresses a resist from foaming in exposure, without deteriorating the throughput. SOLUTION: The apparatus for exposing a wafer periphery is to expose the wafer periphery, using a light shade mask 15. This apparatus comprises a stage 13 for mounting a wafer 1 and an alignment part 16 for detecting the edge of the wafer 1, so as to determine an alignment position for the shade mask 15 according to the shape of the wafer 1.</p> |
