| 摘要 |
<p>PURPOSE:To simplify a manufacturing process by forming a lead electrode and a nonlinear resistance layer in the same pattern and forming a picture element connection electrode only at the overlapping part between the pattern of the lead electrode and the pattern of a picture element electrode. CONSTITUTION:On a lower glass substrate 1, the picture element electrode 2 and picture element connection electrode 4 are formed, and then a nonlinear resistance layer 6 is formed on a lower glass substrate 1 and the picture element connection electrode 4; and resist 15 is formed as a mask and a chromium thin film and the nonlinear resistance layer are etched in this order with the mask pattern of the lead electrode 3 to form the nonlinear resistance layer 5 and lead electrode 3. Further, the same mask is used to etch the chromium thin film on the picture element electrode 2, thus completing an element substrate. On this element substrate, the lead electrode 3 and nonlinear resistance layer are in the same pattern and the picture element connection electrode 4 is formed only at the overlap part between the pattern of the lead electrode and the pattern of the picture element electrode. In this case, the two photomasks are used. Consequently, an exposing process is simplified.</p> |
