发明名称 |
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device |
摘要 |
A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.
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申请公布号 |
US7327455(B2) |
申请公布日期 |
2008.02.05 |
申请号 |
US20040969860 |
申请日期 |
2004.10.22 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
SAKAI TAKAYUKI;KIBE MASANOBU;OHIWA TOKUHISA |
分类号 |
G01B11/02;G01J4/00;G01B11/06;G01B11/22;G01N15/02;H01L21/3065;H01L21/66;H01L21/768 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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