发明名称 BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS
摘要 A steering component is included in an ion implantation system to direct or "steer" an ion beam to a scan vertex of a scanning component downstream of the steering component. In this manner, the scan vertex of the scanning component coincides with the focal point of a parallelizing component downstream of the scanning component. This allows the beam to emerge from the parallelizing component at an expected angle so that ions can be implanted in a desired manner into a workpiece located downstream of the parallelizing component.
申请公布号 US2008067442(A1) 申请公布日期 2008.03.20
申请号 US20070757063 申请日期 2007.06.01
申请人 VANDERBERG BO H;WU XIANGYANG 发明人 VANDERBERG BO H.;WU XIANGYANG
分类号 H01J37/08 主分类号 H01J37/08
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