发明名称 FORMATION D'UN TAMPON DE POLISSAGE A BASE D'OXYDE DE METAL ALCALINO-TERREUX
摘要 The invention involves a method of preparing an alkaline-earth metal oxide-containing polishing pad useful for polishing at least one of semiconductor, magnetic and optical substrates. The method includes introducing a feed stream of gas-filled polymeric microelements into a gas jet, the polymeric microelements having varied density, varied wall thickness and varied particle size. The method passes the polymeric microelements in the gas jet adjacent a Coanda block, the Coanda block having a curved wall for separating the polymeric microelements with Coanda effect, inertia and gas flow resistance. Then it separates various alkaline earth metal oxide constituents from the curved wall of the Coanda block to clean the polymeric microelements.
申请公布号 FR2990438(B1) 申请公布日期 2016.07.15
申请号 FR20130054231 申请日期 2013.05.10
申请人 ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 发明人 ALDEN DONNA, M.;JAMES DAVID, B.;WANK ANDREW, R.;MURNANE JAMES
分类号 C09G1/14;B24D3/34;H01L21/304 主分类号 C09G1/14
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