发明名称 Illuminating apparatus
摘要 Disclosed is an illuminating apparatus including a housing including a lower plate and a side plate and a light emitting module including a substrate disposed on the lower plate and a plurality of light sources disposed on the substrate to be spaced apart from each other, wherein a height of the side plate is determined as a value obtained by dividing a separation distance between adjacent ones of the light sources by a value obtained by multiplying a tangent value of a max intensity angle of each of the light sources by a luminance compensation factor.
申请公布号 US9404626(B2) 申请公布日期 2016.08.02
申请号 US201414189233 申请日期 2014.02.25
申请人 LG INNOTEK CO., LTD. 发明人 Kim Eun Hwa
分类号 F21S4/00;F21K99/00;G06F3/041;G02F1/1335;F21V15/01;F21S8/04;F21Y101/02;F21Y105/00 主分类号 F21S4/00
代理机构 Ked & Associates, LLP 代理人 Ked & Associates, LLP
主权项 1. An illuminating apparatus comprising: a housing including a lower plate and a side plate; and a light emitting module including a substrate disposed on the lower plate and a plurality of light sources disposed on the substrate spaced apart from each other, wherein a height of the side plate is a value obtained by dividing a separation distance between adjacent light sources by a value obtained by multiplying a tangent value of a max intensity angle of each of the light sources by a luminance compensation factor A which is related to a size of each of the light sources, wherein A=−0.1×D+1.6, and D is a diameter of each of the light sources, and wherein the height of the side plate is a distance between the lower plate and a top end of the side plate and the max intensity angle is an angle of max luminous intensity with respect to 0° in a graph showing luminous intensity characteristics of the light sources, and the max intensity angle of each of the light sources is 68° to 72°, wherein the luminance compensation factor A is a value for compensating for uniformity of luminance of a region with 50% of the maximum luminance value, wherein the separation distance is one of a transverse pitch and a longitudinal pitch between the adjacent light sources having a greater value, wherein the side plate includes first and second side surfaces facing each other and third and fourth side surfaces facing each other, wherein lengths of the first and second side surfaces are smaller than those of the third and fourth side surfaces, and a first distance between a first light source and the first side surface is identical to a second distance between a second light source and the second side surface, the first light source being a light source closest to the first side surface, and the second light source being a light source closest to the second side surface, and wherein the length of each of the first and second side surfaces of the side plate is twice the first distance.
地址 Seoul KR