发明名称 PRODUCTION OF X-RAY WINDOW MATERIAL
摘要 PURPOSE:To obtain an X-ray window excellent in the transmission characteristic of low energy X-ray by applying etching to silicon on the rear side of a diamond film formed on a silicon substrate in which boron ions are implanted into reticular state and forming a backup grid. CONSTITUTION:Boron ions are implanted in a single-crystal silicon substrate 1 into reticular state. A thin diamond film 3 is formed on the ion-implanted surface of this silicon substrate 1. Subsequently, etching is applied to the silicon substrate 1 from the side uncoated with the above diamond film 3, and a part 2 in which boron ions are implanted is allowed to remain and formed into a backup grid 5.
申请公布号 JPH03170672(A) 申请公布日期 1991.07.24
申请号 JP19890308173 申请日期 1989.11.28
申请人 SUMITOMO ELECTRIC IND LTD 发明人 YASHIKI TETSUO;FUJIMORI NAOHARU;NAKAHATA HIDEAKI
分类号 G01N23/00;C23C14/06;C23C16/02;C23C16/26;C23C16/27;C23F4/00 主分类号 G01N23/00
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