| 摘要 |
PURPOSE:To enhance resolution and sensitivity by forming a positive type photoresist composition comprising an alkalisoluble resin, and a photosesitive material obtained by reacting a polyhydroxyl compound with a naphthoquinonediazido sulfochloride and specifying the constituent proportions. CONSTITUTION:The photosensitive material of the positive type photoresist composition comprises the mixture of the following photosensitive materials: (1) The ones each having at least one hydroxyl group in the molecule and a 1,2-naphtho-quinonediazido-5-(and/or -4-) sulfonate to hydroxyl group equivalent ratio of 3-20 chloride, amounting to >=50%, (2) the ones having all the hydroxyl groups of the polyhydroxyl compound esterified into the sulfonates, amounting to <= 30%, (3) the ones each having >= 3 hydroxyl groups not esterified into the sulfonate in the molecule, amounting to <= 20%. The polyhydroxyl compound is represented by general formula I in which B is the residue of the compound, and D is represented by formula II or III. |
