| 摘要 |
PURPOSE:To expose the entire surface of a photoresist film having a large area to a laser beam at a high speed with high reproducibility by plotting a recording pattern in strip-like exposing areas selected by step-feeding exposing areas in the Y-axis direction by continuously feeding the laser beam in the X-axis direction and repeating the stepping feeding of the exposing areas and continuous feeding of the laser beam. CONSTITUTION:Strip-like exposing areas Z1, Z2, etc., decided by the inside width of the visual field of an objective lens 3 are successively selected on a photoresist film 2 on a glass substrate 1 by step-feeding exposing areas in the Y-axis direction. On the other hand, a recording pattern is plotted in the selected areas Z1, Z2, etc., by deflecting an intensity-modulated laser beam Lr by a fixed scanning width in the Y-axis direction and, at the same time, continuously feeding the laser beam Lr. By repeating the stepping feeding in the Y-axis direction and continuous feeding in the X-axis direction, the recording pattern is plotted on the photoresist film 2. Therefore, a pattern having a large area can be plotted on the film 2 and the film 2 can be exposed to the laser beam Lr at a high speed with high reproducibility. |
