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发明名称
METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM LITHOGRAPHY EXPOSURE
摘要
申请公布号
JPH08107065(A)
申请公布日期
1996.04.23
申请号
JP19940266193
申请日期
1994.10.05
申请人
TOSHIBA MACH CO LTD
发明人
KATAYAMA MITSUNOBU
分类号
G03F7/20;H01L21/027;(IPC1-7):H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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