发明名称 |
NEUTRAL BEAM GRID STRUCTURE |
摘要 |
A neutral beam grid structure is provided to facilitate a micro-patterning process by maintaining a straightness of a neutral beam. An ion beam from an ion beam source(100) passes through a grid(200), which is located behind an ion source. Plural slits(300) are normally formed in a vertical direction on a surface of the grid. The slits are formed to be in a bar-like oval shape. A ratio of a diameter of the slit with respect to a hole size of the ion beam source lies between 1:0.3 and 1:0.5, such that a mechanical strength of the grid is increased. The number of slits formed on the grid is determined according to a grid size and a spacing between the grids.
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申请公布号 |
KR20080081873(A) |
申请公布日期 |
2008.09.10 |
申请号 |
KR20080061416 |
申请日期 |
2008.06.27 |
申请人 |
SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION |
发明人 |
YEOM, GEUN YOUNG;PARK, SANG DUK;PARK, BYOUNG JAE |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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