发明名称 NEUTRAL BEAM GRID STRUCTURE
摘要 A neutral beam grid structure is provided to facilitate a micro-patterning process by maintaining a straightness of a neutral beam. An ion beam from an ion beam source(100) passes through a grid(200), which is located behind an ion source. Plural slits(300) are normally formed in a vertical direction on a surface of the grid. The slits are formed to be in a bar-like oval shape. A ratio of a diameter of the slit with respect to a hole size of the ion beam source lies between 1:0.3 and 1:0.5, such that a mechanical strength of the grid is increased. The number of slits formed on the grid is determined according to a grid size and a spacing between the grids.
申请公布号 KR20080081873(A) 申请公布日期 2008.09.10
申请号 KR20080061416 申请日期 2008.06.27
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 YEOM, GEUN YOUNG;PARK, SANG DUK;PARK, BYOUNG JAE
分类号 H01L21/3065 主分类号 H01L21/3065
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