| 摘要 |
PURPOSE:To evaluate the performance of a photoresist film corresponding to the deformation in the cut surface shape of the non-dissolved part of the photoresist film by observing the cut surface shape of the non-dissolved part. CONSTITUTION:A substrate with the photoresist film subjected to image exposing is cut in the direction perpendicular to the substrate plane to obtain a leaf 10. The leaf 10 is placed under a microscope in such a manner that the cut face thereof can be observed. A developing soln. passed through a developing soln. injecting device 6 and a developing soln. supplying pipe 4 is brought into contact with the photoresist film side of the leaf 10 and while the soluble part of the photoresist film is dissolved, the cut surface shape of the non-dissolved part of the film is observed. The performance of the photoresist film corresponding to the deformation of the cut surface shape of the non-dissolved part is evaluated. The change in the state during the development of the photoresist film subjected to the image exposing is continuously observed in detail in this way. |
