发明名称 RESIST COMPOSITION
摘要 PURPOSE:To obtain the resist compsn. with which scum hardly arises by incorporating a specific compd. into the resist compsn. CONSTITUTION:The alkaline-soluble siloxane polymer contg. at least one of the units expressed by formulas I and II {where X is the same or different and denotes one kind selected from the group of hydrogen, group expressed by formula III, group expressed by formula IV (R denotes hydrogen, hydrocarbon or substd. hydrocarbon), carboxyl group; R1, R2, R3, R4, R5, and R6 are the same of different and one kind selected from the group consisting of hydrogen, hydroxyl group, substd. or unsubstd. aliphat. and arom, hydrocarbon; at least one is a hydroxyl group; l, m, n and p denote 0 or positive integer; there is not case where l and m are simultaneously 0} and the compd. having active hydrogen are incorporated into this resist compsn.
申请公布号 JPH0436755(A) 申请公布日期 1992.02.06
申请号 JP19900141659 申请日期 1990.06.01
申请人 FUJI PHOTO FILM CO LTD;NIPPON TELEGR & TELEPH CORP <NTT> 发明人 KOKUBO TADAYOSHI;SAKAMOTO ATSUSHI;TANAKA HARUYORI;BAN KOJI
分类号 G03F7/075;C08G77/14;C08G77/38;G03F7/004;G03F7/022;H01B3/00;H01L21/027;H01L21/30 主分类号 G03F7/075
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