| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gas cleaning method capable of simply removing dimethylsiloxane from a material gas containing dimethylsiloxane for a long period of time, and a gas cleaning device. <P>SOLUTION: In (1) the gas cleaning method, the temperature of the material gas containing dimethylsiloxane is measured and after the material gas is heated such that the temperature becomes a temperature higher than the temperature by 2°C and not more than 50°C, it is introduced to an activated carbon filling layer 2 to remove dimethylsiloxane from the material gas. Further, (2) in the gas cleaning method, an activated carbon having fine pores with an average fine pore diameter of 2.0-4.0 nm is used as the activated carbon in the gas cleaning method. (3) The gas cleaning device is provided with a detection part for measuring the temperature of the material gas containing dimethylsiloxane; a previously heating part for heating the material gas based on the temperature measured by the detection part; and the activated carbon filling layer 2. In the gas cleaning device, the material gas heated by the previously heating part is introduced to the activated carbon filling layer 2 to remove dimethylsiloxane from the material gas. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
