发明名称 PLANARIZATION OF LAYER OVER CAVITY
摘要 PROBLEM TO BE SOLVED: To provide a method of fabricating a micro device having a mirror surface. SOLUTION: The method of fabricating a microstructure includes disposing a sacrificial material in a recess formed in a lower layer and forming a layer of compensatory material on the sacrificial material in the recess. A first portion of the compensatory material is removed to form a substantially flat surface on the sacrificial material. The substantially flat surface is substantially co-planar with the upper surface of the lower layer. The method includes that an upper layer is formed on the lower layer and the substantially flat surface. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008209924(A) 申请公布日期 2008.09.11
申请号 JP20080037817 申请日期 2008.02.19
申请人 SPATIAL PHOTONICS INC 发明人 PAN SHAOHER X;LEE CHII GUANG
分类号 G02B26/08;B81C1/00 主分类号 G02B26/08
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