发明名称 Lateral devices containing permanent charge
摘要 A lateral device includes a gate region connected to a drain region by a drift layer. An insulation region adjoins the drift layer between the gate region and the drain region. Permanent charges are embedded in the insulation region, sufficient to cause inversion in the insulation region.
申请公布号 US9419085(B2) 申请公布日期 2016.08.16
申请号 US201514936526 申请日期 2015.11.09
申请人 MaxPower Semiconductor, Inc. 发明人 Darwish Mohamed N.;Paul Amit
分类号 H01L29/66;H01L29/40;H01L29/78;H01L29/10 主分类号 H01L29/66
代理机构 代理人 Groover, III Robert O.;Groover Gwendolyn S. S.
主权项 1. A lateral semiconductor device, comprising: a first-conductivity-type source region; a second-conductivity-type body region, interposed between said source region and a first-conductivity-type drift region, said body region being capacitively coupled to a gate electrode lying at least partially in a trench; a first-conductivity-type drain region; permanent charge embedded in an insulating region which vertically adjoins said drift region, said permanent charge having a polarity which tends to deplete adjacent semiconductor material; wherein said gate electrode is separated from the adjacent semiconductor material by a layer of gate oxide; and wherein the gate oxide adjacent to said drift region is thicker than the gate oxide adjacent to said body region.
地址 San Jose CA US