发明名称 Multi-layered integrated circuit with selective temperature coefficient of resistance
摘要 The integrated circuit described herein includes: a first resistor having a first trench in a dielectric layer, the first trench having a first width; a second resistor having a second trench in the dielectric layer, the second trench having a second width not equal to the first width; a trench in a dielectric layer, a first conductive layer having a first TCR and coating at least a portion of the first trench and the second trench; and a second conductive layer having a second TCR and coating at least a portion of the first conductive layer in each of the first trench and the second trench, wherein the second TCR is not equal to the first TCR, and wherein the TCR of the IC is selected based on a dimension of the trench, a thickness of the first conductive layer, and a thickness of the second conductive layer.
申请公布号 US9418982(B2) 申请公布日期 2016.08.16
申请号 US201414578678 申请日期 2014.12.22
申请人 International Business Machines Corporation 发明人 Deng Yanqing;Lee Sungjae;Nowak Edward J.;Wallner Jin Z.
分类号 H01L27/02;H01L27/08;H01L49/02;H01L21/768 主分类号 H01L27/02
代理机构 Hoffman Warnick LLC 代理人 Meyers Steven J.;Hoffman Warnick LLC
主权项 1. An integrated circuit (IC) with a selective temperature coefficient of resistance (TCR), the IC comprising, a first resistor having a first trench in a dielectric layer, the first trench having a first width; a second resistor having a second trench in the dielectric layer, the second trench having a second width not equal to the first width; a first conductive layer coating at least a portion of each of the first trench and the second trench, the first conductive layer having a first TCR; and a second conductive layer coating at least a portion of the first conductive layer in each of the first trench and the second trench, the second conductive layer having a second TCR, wherein the second TCR is not equal to the first TCR, and wherein the TCR of the IC is selected based on a dimension of the first trench, a dimension of the second trench, a thickness of the first conductive layer, and a thickness of the second conductive layer.
地址 Armonk NY US