| 发明名称 |
POSITIVE TYPE RADIATION SENSITIVE MATERIAL |
| 摘要 |
PURPOSE:To elevate sensitivity to radiation and easily form a fine and high precision pattern etc., by coopolymerize vinyl ferrocene with a monomer capable of forming a positive type radiation sensitive high polymer. |
| 申请公布号 |
JPS52146218(A) |
申请公布日期 |
1977.12.05 |
| 申请号 |
JP19760062274 |
申请日期 |
1976.05.31 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MIYAMURA MASATAKA;MIURA AKIRA;TADA TSUKASA |
| 分类号 |
G03F7/039;G03C1/72;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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