发明名称 DEVICE AND METHOD FOR EXPOSURE AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent the outside air from entering a sealed container which hermetically contains an exposure optical system. SOLUTION: A wafer W is exposed to the light from an exposure light source 1 through an arranged optical system 2, lighting optical systems 3a to 3d, and the projection optical system 4. The optical system is put in the sealed container 14 which is filled with inert gas supplied from a gas supply device 16, and opening/closing valves 15a and 15b are arranged on its gas intake side and outlet side. A controller 19 controls them independently of control over the gas supply system and then, for example, when gas supply is stopped, the valves are automatically opened and closed to seal up the inert gas in the sealed container 14, thereby preventing outside air from entering it.
申请公布号 JP2002260980(A) 申请公布日期 2002.09.13
申请号 JP20010053384 申请日期 2001.02.28
申请人 CANON INC 发明人 ARAKAWA TAKAYOSHI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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