RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resin for a photoresist composition good in resolution and characteristics of line edge roughness, a photoresist composition using the resin and a method for forming a resist pattern.

SOLUTION: The resin for the photoresist composition has a hydroxy group bonding to a carbon atom at a polymer end, where a carbon atom at the α-position of the hydroxy group has at least one electron withdrawing group.

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