发明名称 Manipulator assembly in ion implanter
摘要 A manipulator assembly in an ion implanter comprises a ground electrode, a first suppression electrode located on a first side of the ground electrode facing an ion source device for producing ion beams, a second suppression electrode which is located on a second side of the ground electrode opposite to the first side, connection legs which electrically connect and mechanically support the first and second suppression electrodes; and an insulator which is located between the ground electrode and the second suppression electrode to insulate the ground electrode from the first and second suppression electrodes.
申请公布号 US7271399(B2) 申请公布日期 2007.09.18
申请号 US20040025595 申请日期 2004.12.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BONG SUNG-JONG;EOM HONG-KUK;YOU DOO-SANG
分类号 H01J37/317;H01J3/26;H01J37/08;H01L21/265 主分类号 H01J37/317
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