| 摘要 |
According to an embodiment of the present invention, provided is a processing chamber which comprises: a chamber body having an internal space; a gas injection unit coupled to an upper portion of the internal space of the chamber body and configured to spray a gas toward a bottom surface of the internal space; a baffle plate having an induction path for inducing the gas to a lower portion of the internal space along a sidewall of the internal wherein the gas flowing along the sidewall of the internal space is injected into the baffle plate and the baffle plate is arranged adjacently to the sidewall of the internal space; and a gas exhaust unit configured to exhaust the gas moving to the lower portion of the internal space. |
