HIGH DENSITY SINTERED TARGET MATERIAL FOR FORMING ELECTRIC CONDUCTIVE TRANSPARENT THIN FILM BY SPUTTERING

摘要

PURPOSE:To increase the density of a sintered target material for forming an electric conductive transparent thin film by sputtering. CONSTITUTION:This target material for forming an electric conductive transparent thin film by sputtering is made of a high density sintered body having >=90% theoretical density ratio and a compsn. consisting of 5-15wt.% SnO2, 0.01-5wt.% ZrO2 and/or Y2O3 and the balance In2O3 with inevitable impurities.