发明名称 PHOTOMASK
摘要 <p>PURPOSE:To lessen the deterioration of curved part and to allow the formation of high-accuracy patterns by lowering the transmittance of the branched or curved parts of light transmissive patterns. CONSTITUTION:The sizes of resist grooves in the corner parts increase if the L-shaped light transparent patterns 10 are exposed by using the positive type resist. The light intensity distribution calculated by simulation indicates that the light intensity in the corner parts is high. This phenomenon arises not only in the L-shaped corners but in the branch parts of the pattern shapes having T-shaped branched parts as well. The effective exposure is locally decreased by changing the transmittance of the branch parts and curved parts, by which the light intensity distribution in the branch parts and curved parts is equal to the same level as the level of the other parts and the deterioration of the patterns can be lessened. The change of the effective exposure can be made by sticking a material 9 which lowers the transmittance to the curved parts or disposing patterns below the resolution threshold thereto.</p>
申请公布号 JPH0572713(A) 申请公布日期 1993.03.26
申请号 JP19910231472 申请日期 1991.09.11
申请人 HITACHI LTD 发明人 SHIGENIWA AKIYOSHI;OKAZAKI SHINJI;IMAI AKIRA
分类号 G03F1/36;G03F1/68;H01L21/027 主分类号 G03F1/36
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