| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to enhance the resolution of the resist composition without sacrificing sensitivity and profiles and resistance to the occurrence of scum and other performances by incorporating a mixed ester of a quinonediazidosulfonate ester of a phenol compound and a sulfonate ester not containing a specified quinonediazido group. SOLUTION: This positive resist composition contains an alkali-soluble novolak resin and a radiation sensitive agent, and this agent is the mixed ester of the quinonediazidosulfonate ester of the phenol compound and the sulfonate ester not containing the quinonediazido group. The phenol compound to the esterified is a compound having at least one phenolic hydroxy group in the molecular structure. The fraction, having no quinonediazido group, of the sulfonate ester is the sulfonate esters of various compounds, such as aliphatic or alicyclic or aromatic or aromatic aliphatic compounds, and the structure of them are represented by the formula in which R is an optionally substituted alkyl or alicyclic hydrocarbon groups. |
