| 摘要 |
<p>PURPOSE:To supply the processing liquid uniformly while thermal deformation of a holder is suppressed, by immersing a work to be processed and a polisher completely in a processing solution, and supplying the solution having passed through the polisher to the work from the opposed face side of the polisher. CONSTITUTION:A polishing device is chiefly composed of a work holding part 2 which holds a work to be processed 1 and rotates it, a polisher holding part 4 which presses polisher 3 to the work 1 and rotates the polisher in reversals by a swing driving part 13, and a processing solution supply part 6 to supply a processing solution 5 to the part of processing. The processing solution 5 is interposed between the work 1 and polisher 3 and they are moved in relative motions, and thereby polishing is performed in the condition being contacted. At this time, the work 1 and polisher 3 are immersed completely in the processing solution 5 contained in a processing trough 7. The solution 5 having passed through the polisher 3 is supplied to the work 1 from the opposed face side of the polisher 3 to the work 1.</p> |
