| 发明名称 |
METHOD FOR MANUFACTURING STENCIL MASK AND SEMICONDUCTOR DEVICE |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To conduct exposure by an EPL without using a complementary segment mask and without conducting double exposure for a pattern requiring the complementary segment. <P>SOLUTION: It is designed that the pattern 23 requiring the complementary segement is arranged in a fuzzy boundary region 43 and the pattern is complementarily segmented between adjacent subfields 1 by the use of the fuzzy boundary. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
| 申请公布号 |
JP2005209996(A) |
申请公布日期 |
2005.08.04 |
| 申请号 |
JP20040016853 |
申请日期 |
2004.01.26 |
| 申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC |
发明人 |
SAKAGAMI HIROSHI |
| 分类号 |
G03F1/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 |
主分类号 |
G03F1/20 |
| 代理机构 |
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| 主权项 |
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