发明名称 Illumination optical system and exposure apparatus
摘要 An illumination optical system that is used for an exposure apparatus that includes a mirror and exposes an object, illuminates a surface to be illuminated using light from a light source, and includes a filter member arranged at a position that substantially has a Fourier transform relationship with the surface to be illuminated, the filter member including a transmittance distribution preset to correct a non-uniformity of a transmittance distribution of the illumination optical system caused by the mirror.
申请公布号 US7345741(B2) 申请公布日期 2008.03.18
申请号 US20050144710 申请日期 2005.06.02
申请人 CANON KABUSHIKI KAISHA 发明人 SHIOZAWA TAKAHISA;GOTO YOSHIO
分类号 G03B27/72;G03B27/42;G03B27/54;G03F7/20 主分类号 G03B27/72
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