发明名称 |
MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICE |
摘要 |
<p>In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.</p> |
申请公布号 |
EP2005249(A1) |
申请公布日期 |
2008.12.24 |
申请号 |
EP20070702604 |
申请日期 |
2007.01.05 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
MANN, HANS-JUERGEN;ULRICH, WILHELM |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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