| 摘要 |
<p>The resist processing apparatus comprises a loader/unloader section (40) provided with a plurality of cassettes (42a, 42b), a first convey mechanism (41) provided in the loader/unloader section (40), and for taking out an unprocessed substrate from the cassette, and for putting a processed substrate into the cassette, a first processing section (10) provided at one side of the loader/unloader section (40) and having a resist coating section (18) for coating a resist to the substrate, a second processing section (30) provided at another side of the loader/unloader section (40) to be apart from the first processing section (10), and having a development processing section (35) for developing the resist coated to the substrate, a second convey mechanism for receiving an unprocessed substrate from the first convey mechanism (41), for conveying the unprocessed substrate to the first processing section (10), and for delivering the substrate coated with a resist by the resist coating section (18), to the first convey mechanism (47), and a third convey mechanism (32) for receiving an unprocessed substrate from the first convey mechanism (41), for conveying the unprocessed substrate to the second processing section (30), and for delivering the substrate developed by the development processing section (35), to the first convey mechanism (41). <IMAGE></p> |
