| 摘要 |
<p>PURPOSE:To prevent the peeling of a film in the peripheral part of the mask by forming a mask substrate to be coated with the film of a resist, etc., to a circular shape or a polygonal shape approximate to the circular shape and forming the substrate to a curved surface shape bulging the outer peripheral edge. CONSTITUTION:The mask substrate 3 to be coated with the film 2 of a resist, SOG(spin on glass), etc., on its surface is formed to the circular shape or the polygonal shape approximate to the circular shape and in addition, its outer peripheral edge is bulged to facilitate the trimming of the outer peripheral part of the mask. Since the mask substrate 3 has not projecting parts, the surface of the substrate 3 is uniformly coated with the coating film 2 of the resist, etc., up to the outer periphery even if this coating film is formed thereon. Further, the outer peripheral edge is bulged and, therefore, the trimming of the spin coating film 2 of the resist, etc., in the outer peripheral part of the mask is possible. Then, the film peeling in the peripheral part of the substrate 3 does not arise even if handling, etc., are executed. Since the adhesion of the peeled film as a dust source on the mask does not arise, the generation of a transfer defect at the time of processing is not executed.</p> |
