| 摘要 |
PROBLEM TO BE SOLVED: To realize a resist hole pattern inspection method and device capable of determining an opening condition of a complicated shape of contact hole by a simple method. SOLUTION: When a resist of an inspected object is irradiated with an electron beam and when a shape of a resist hole pattern is inspected using a secondary electron generated from a resist surface, using a scanning electron microscope or the like, a signal of the output secondary electron is divided into a plurality of two-dimensional network picture elements, an intensity distribution of the each picture element is classified by an optional threshold value, and the quality of the resist pattern is determined based on a shape or an area of a class of the picture elements in the same classification. COPYRIGHT: (C)2005,JPO&NCIPI |
