SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREOF

摘要

A method of manufacturing a semiconductor substrate includes a device-forming process of forming a plurality of device areas in a substrate section, a first wiring process of forming circuit wirings connected to the plurality of device areas, an electrode pad-forming process of forming a plurality of electrode pads, a second wiring process of forming a potential adjustment wiring electrically connecting at least a part of the electrode pads, an electrode-forming process of forming electrode bodies on the electrode pads by electroless plating after the second wiring process, and a potential adjustment-releasing process of releasing a connection by the potential adjustment wiring after the electrode-forming process.

主权项

1. A method of manufacturing a semiconductor substrate in which a plurality of device areas functioning as a semiconductor device are disposed, and an electrode portion including a plurality of electrodes in which electrode bodies are formed on respective electrode pads is formed in each of the plurality of device areas, the method comprising:
a device-forming process of forming the plurality of device areas in a substrate section; a first wiring process of forming circuit wirings connected to the device areas; an electrode pad-forming process of forming the electrode pads; a second wiring process of forming a potential adjustment wiring electrically connecting at least a part of the electrode pads; an electrode-forming process of forming the electrode bodies on the electrode pads by electroless plating after the second wiring process; and a potential adjustment-releasing process of releasing a connection by the potential adjustment wiring after the electrode-forming process.