发明名称 Semiconductor Packages and Methods of Forming the Same
摘要 A semiconductor device and method for forming the semiconductor device is provided. The semiconductor device includes an integrated circuit having through vias adjacent to the integrated circuit die, wherein a molding compound is interposed between the integrated circuit die and the through vias. The through vias have a projection extending through a patterned layer, and the through vias may be offset from a surface of the patterned layer. The recess may be formed by selectively removing a seed layer used to form the through vias.
申请公布号 US2016163564(A1) 申请公布日期 2016.06.09
申请号 US201514696198 申请日期 2015.04.24
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Yu Chen-Hua;Liu Chung-Shi;Lin Chih-Wei;Cheng Ming-Da
分类号 H01L21/48;H01L23/538;H01L23/28;H01L23/00;H01L21/56 主分类号 H01L21/48
代理机构 代理人
主权项
地址 Hsin-Chu TW