发明名称 |
METAL ION-FREE PHOTORESIST DEVELOPER COMPOSITION |
摘要 |
An aqueous metal ion-free developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is quaternary ammonium compound. The developer permits a reduction of from 40-50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution. |
申请公布号 |
DE3268203(D1) |
申请公布日期 |
1986.02.13 |
申请号 |
DE19823268203 |
申请日期 |
1982.01.28 |
申请人 |
SHIPLEY COMPANY INC. |
发明人 |
CAWSTON, JOHN D.;BECKER, PAUL E. JR. |
分类号 |
G03F7/30;G03F7/32;(IPC1-7):G03F7/26 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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