发明名称 Method for producing a vertically emitting laser
摘要 The invention is directed to a vertically emitting laser and a method of manufacturing such a laser having a current aperture and a semiconductor relief. The semiconductor relief and the current aperture are defined in the same processing operation, thereby causing the semiconductor relief and the current aperture to be substantially self-aligned with respect to one another. In addition, such processing results in an area ratio of the semiconductor relief and the current aperture to be substantially self-scaling with respect to processing variations.
申请公布号 US7033853(B2) 申请公布日期 2006.04.25
申请号 US20040811112 申请日期 2004.03.26
申请人 INFINEON TECHNOLOGIES AG 发明人 SUPPER DIPL.-ING. DANIEL
分类号 H01L21/00;H01S5/042;H01S5/183 主分类号 H01L21/00
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