| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus which eliminates a cleaning operation in an outside reaction tube. SOLUTION: The vertical-type CVD apparatus 1 (semiconductor manufacturing apparatus) includes an inside reaction tube 3 in which a semiconductor substrate 50 is located, an outside reaction tube 5 which is located so as to cover the outside of the inside reaction tube 3 and a vacuum flange 6 is fitted on a bottom portion 5a, and the inside reaction tube 4 which is positioned between the inside reaction tube 3 and the outside reaction tube 5 and covers the side and upper side of the inside reaction tube 3. COPYRIGHT: (C)2009,JPO&INPIT
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