| 摘要 |
In a reticle substrate is used for forming a reticle held on a stepper and has main surfaces opposing each other, side faces, and chamfered surfaces formed between main surfaces and side faces, a flatness-measuring area is defined as an area excluding a peripheral area of a width of 3 mm inwardly laid from a boundary between the main surface and the chamfered surfaces and has a flatness of 0.5 mum or less, and a maximum height from a reference plane falls between -1 and 0 mum at the boundary between the main surface and the chamfered surface.
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