发明名称 |
Method for simultaneous patterning of features with nanometer scale gaps |
摘要 |
A method of fabricating a pattern on a surface of a substrate includes applying at least one non-molecular lithographic technique with at least one molecular lithographic technique to simultaneously define a size and shape of at least one of the features of the pattern. The pattern includes a nanoscale gap between features, the gap having a width defined by the thickness of one or more molecular layers used in one of the molecular lithographic techniques.
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申请公布号 |
US7432039(B2) |
申请公布日期 |
2008.10.07 |
申请号 |
US20040979023 |
申请日期 |
2004.11.01 |
申请人 |
THE PENN STATE RESEARCH FOUNDATION |
发明人 |
MC CARTY GREGORY S.;CATCHMARK JEFFREY M.;LAVALLEE GUY P. |
分类号 |
G03F7/00;G03C5/00;G03F;H01L51/40 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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