发明名称 NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
摘要 The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.
申请公布号 KR20040024547(A) 申请公布日期 2004.03.20
申请号 KR20037011139 申请日期 2003.08.25
申请人 发明人
分类号 G03F7/039;C08F220/18;C08F234/02;H01L21/027 主分类号 G03F7/039
代理机构 代理人
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