| 发明名称 |
Method of manufacturing ceramic film and pressure heat treatment device used therefor |
| 摘要 |
<p>A method of manufacturing a ceramic film includes providing a treatment target in which a raw material body including a complex oxide is applied to a substrate, and crystallizing the raw material body by holding the treatment target in a chamber and subjecting the treatment target to a heat treatment at a predetermined pressure in a gas which is pressurized at two atmospheres or more and includes at least an oxidizing gas. The gas is supplied to the chamber after being heated to a predetermined temperature in advance. <IMAGE></p> |
| 申请公布号 |
EP1460049(A2) |
申请公布日期 |
2004.09.22 |
| 申请号 |
EP20040251512 |
申请日期 |
2004.03.17 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KIJIMA, TAKESHI;NATORI, EIJI |
| 分类号 |
B05D3/02;H01L21/316;C04B35/491;C04B35/622;C04B41/00;C23C18/12;C30B1/12;F27B5/16;F27B17/00;H01L21/02;H01L21/324;H01L21/82;H01L21/8239;H01L27/10;(IPC1-7):C04B35/622 |
主分类号 |
B05D3/02 |
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