| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce a volume of a loading lock chamber, and to shorten the time required for a vent and a vacuum of an inside of the loading lock chamber. <P>SOLUTION: This substrate inspection device for inspecting a substrate by irradiating a substrate with electron beam from an electron gun toward the substrate and by detecting a secondary electron generated from a pixel of the substrate due to the electron irradiation is provided with an inspection chamber 2 for inspecting the substrate under a vacuum condition, the loading lock chamber 3 for loading and unloading the substrate with respect to an atmospheric side, and a conveying chamber 4 for conveying the substrate between the inspection chamber and the loading lock chamber. The conveying chamber 4 is provided with a conveying mechanism 4d including two conveying means (substrate carrying-in arm 4a, substrate carrying-out arm 4b) capable of moving the substrate independently between an inside and an outside of the conveying chamber, In this device, transfer between the carrying-in substrate and the carrying-out substrate executed conventionally in the loading lock chamber is conducted in the conveying chamber, by constituting the conveying mechanism to include the two conveying means capable of moving the substrate independently between the inside and the outside of the conveying chamber. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
