| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect observation device and a method thereof by which a defect to be observed can be observed with a high throughput by detecting the defect by an optical microscope with high sensitivity and positively placing the defect into the field of view of a scanning electron microscope and the like. SOLUTION: The defect observation device includes the optical microscope which optically detects the defect again on a sample placed on a stage provided in a vacuum chamber, and the electron microscope which observes the defect on the sample after moving the stage to place the defect into the field of view of the microscope. The optical microscope further includes a height detection optical system which optically detects the height of the sample placed on the stage, an illumination optical system which illuminates the defect on the sample, and a detection optical system which detects the image signal of the defect by gathering reflected light obtained from the defect on the sample having been illuminated by the illumination optical system, wherein focusing is performed for the optical microscope based on height information detected for the sample by the height detection optical system. COPYRIGHT: (C)2009,JPO&INPIT
|
