Manufacturing Method of Sputtering Target and Sputtering Target,申请号KR20060024106-传众专利搜索

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发明名称	Manufacturing Method of Sputtering Target and Sputtering Target
摘要
申请公布号	KR100771434(B1)	申请公布日期	2007.10.30
申请号	KR20060024106	申请日期	2006.03.15
申请人		发明人
分类号	C23C14/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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