| 发明名称 |
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE |
| 摘要 |
The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate by using a mold, the apparatus including a tilt unit configured to tilt the mold and the substrate relatively, a detection unit configured to detect an interference pattern between light reflected by the mold and light reflected by the substrate, and a control unit configured to control, based on the interference pattern detected by the detection unit in a state in which the mold and the imprint material on the substrate are in contact with each other, the tilt unit to reduce relative tilts between the mold and the substrate in the state. |
| 申请公布号 |
US2016193758(A1) |
申请公布日期 |
2016.07.07 |
| 申请号 |
US201514978559 |
申请日期 |
2015.12.22 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Fujimoto Masayoshi;Yamazaki Takuro;Funayoshi Tomomi;Yamaguchi Hiromitsu |
| 分类号 |
B29C43/58;B29C33/42;B29C43/02 |
主分类号 |
B29C43/58 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An imprint apparatus which forms a pattern in an imprint material on a substrate by using a mold, the apparatus comprising:
a tilt unit configured to tilt the mold and the substrate relatively; a detection unit configured to detect an interference pattern between light reflected by the mold and light reflected by the substrate; and a control unit configured to control, based on the interference pattern detected by the detection unit in a state in which the mold and the imprint material on the substrate are in contact with each other, the tilt unit to reduce relative tilts between the mold and the substrate in the state. |
| 地址 |
Tokyo JP |
