发明名称 IMPEDANCE MATCHING CIRCUIT FOR OPERATION WITH A KILOHERTZ RF GENERATOR AND A MEGAHERTZ RF GENERATOR TO CONTROL PLASMA PROCESSES
摘要 Described is an impedance matching circuit (IMC). The IMC includes a first circuit, wherein the first circuit has an input unit coupled to a kilohertz (kHz) radio frequency (RF) generator. The IMC includes a second circuit, wherein the second circuit has an input unit coupled to a low frequency megahertz (MHz) RF generator. The IMC includes a third circuit, wherein the third circuit has an input unit coupled to a high frequency MHz RF generator. The IMC includes output units of the first, second, and third circuits coupled to an input unit of an RF transmission line. The first circuit and the second circuit provide separation between a kHz RF signal transmitted through the first circuit and a low frequency MHz RF signal transmitted through the second circuit, respectively.
申请公布号 KR20160106499(A) 申请公布日期 2016.09.12
申请号 KR20160022427 申请日期 2016.02.25
申请人 LAM RESEARCH CORPORATION 发明人 MARAKHTANOV ALEXEI;KOZAKEVICH FELIX;HOLLAND JOHN PATRICK;JACOBS BRETT
分类号 H01J37/32;H03H7/38;H03H7/40;H05H1/46 主分类号 H01J37/32
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