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发明名称
Verfahren zum Herstellen eines Halbleiterbauelementes und darnach hergestelltes Halbleiterbauelement
摘要
申请公布号
CH452057(A)
申请公布日期
1968.05.31
申请号
CH19650012977
申请日期
1965.09.20
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
DR. SEITER,HARTMUT,DIPL.-CHEM.;DR. WINSTEL,GUENTER,DIPL.-PHYS.;ZSCHAUER,KARL-HEINZ,DIPL.-PHYS.
分类号
C30B25/02;H01L21/205;(IPC1-7):H01L7/02
主分类号
C30B25/02
代理机构
代理人
主权项
地址
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