发明名称 MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 PURPOSE:To bury even in a deep and wide trench easily and to plane the surface, by burying a dielectric film in the trench for separating elements after forming the element regions. CONSTITUTION:On a P-type substrate 1, an N<+> buried layer and P<+> channel stopper are formed selectively, and base, emitter and collector layers are formed in an N epitaxial layer 4. After an oxide film 9 on the layer 4 is opened and an electrode is formed, a trench 5 is formed and a planed organic film 12 is formed. Thereafter, openings are formed over the respective elements and connecting wiring 11 is formed to finish the device.
申请公布号 JPS61220439(A) 申请公布日期 1986.09.30
申请号 JP19850062401 申请日期 1985.03.27
申请人 NEC CORP 发明人 SUGANUMA TORU
分类号 H01L21/3205;H01L21/76 主分类号 H01L21/3205
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