METHOD FOR OPTIMIZING FOCUS OF OPTICAL INSPECTION SYSTEM, METHOD AND APPARATUS FOR DETECTING OPTICAL DEFECT USING THE SAME

摘要

PURPOSE: A method for optimizing a focus of an optical inspection system, a method and an apparatus for detecting an optical defect using the same are provided to detect easily a defect of a semiconductor device by determining rapidly an optimum focus value. CONSTITUTION: An irradiation process is performed to irradiate light on the surface of a substrate(S10). An optical inspection system forms image information by sensing the light reflected from the surface of the substrate according to plural focus values(S20). A correlation among the focus values and the image information and gain values of the optical inspection system is determined(S30). The focus value corresponding to the minimum gain value is set up as a defect detection focus value(S40).