发明名称 METHOD AND APPARATUS FOR FORMING CRYSTALLINE PORTIONS OF SEMICONDUCTOR FILM
摘要 A crystallization method which generates a crystallized semiconductor film by irradiating at least one of a polycrystal semiconductor film and an amorphous semiconductor film with light beams having a light intensity distribution with an inverse peak pattern that a light intensity is increased toward the periphery from an inverse peak at which the light intensity is minimum, wherein a light intensity value a (standardized value) in the inverse peak when a maximum value of the light intensity in the light intensity distribution with the inverse peak pattern is standardized as 1 is set to 0.2<=value alpha<=0.8.
申请公布号 US2008032244(A1) 申请公布日期 2008.02.07
申请号 US20070866577 申请日期 2007.10.03
申请人 发明人 TANIGUCHI YUKIO;MATSUMURA MASAKIYO
分类号 G03F7/26;B23K26/073;G02B27/09;G03C5/00;G03C11/00;G03F9/00;H01L21/20;H01L21/268;H01L21/336;H01L21/77 主分类号 G03F7/26
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