发明名称 |
METHOD AND APPARATUS FOR FORMING CRYSTALLINE PORTIONS OF SEMICONDUCTOR FILM |
摘要 |
A crystallization method which generates a crystallized semiconductor film by irradiating at least one of a polycrystal semiconductor film and an amorphous semiconductor film with light beams having a light intensity distribution with an inverse peak pattern that a light intensity is increased toward the periphery from an inverse peak at which the light intensity is minimum, wherein a light intensity value a (standardized value) in the inverse peak when a maximum value of the light intensity in the light intensity distribution with the inverse peak pattern is standardized as 1 is set to 0.2<=value alpha<=0.8.
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申请公布号 |
US2008032244(A1) |
申请公布日期 |
2008.02.07 |
申请号 |
US20070866577 |
申请日期 |
2007.10.03 |
申请人 |
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发明人 |
TANIGUCHI YUKIO;MATSUMURA MASAKIYO |
分类号 |
G03F7/26;B23K26/073;G02B27/09;G03C5/00;G03C11/00;G03F9/00;H01L21/20;H01L21/268;H01L21/336;H01L21/77 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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